Nitride wafers

Silicon Nitride Wafers Si3N4

WaferPro offers a variety of film processing options for your silicon needs. This includes LPCVD nitride, and WaferPro can provide wafers with stoichiometric LPCVD nitride or low stress LPCVD nitride, as well as super low stress LPCVD nitride. We also offer high quality PECVD nitride, Low stress PECVD nitride, and PECVD OxyNitride. Wafer diameter is available from 2″ to 300mm and nitride thickness is available from 100Å to 20,000Å.

Any amount of quantity can be ordered with a minimum batch order of 25 wafers.

Types of LPCVD NITRIDE

LPCVD Nitride – Low Pressure Chemical Vapor Deposition Nitride

Applied to both sides of the wafer at the same time.

Used where temperature is not critical.

The higher temperature process which leads to more stable, higher purity film.

Stoichiometric LPCVD Nitride

Film thickness: 100Å – 4500Å on both sides
Film stress: =>800±50 MPa Tensile Stress

Low Stress LPCVD Nitride

Film thickness: 100Å – 20,000Å on both sides
Film stress: <250±50 MPa Tensile Stress

Super Low Stress LPCVD Nitride

Film thickness: 100Å – 20,000Å on both sides
Film stress: <100±50 MPa Tensile Stress

Silicon Nitride wafers
PECVD Nitride wafers

Types of PECVD Nitride

PECVD Nitride – Plasma Enhanced Chemical Vapor Deposition Nitride

Applied to only one side of the wafer.

More suitable when a lower temperature process is needed.

PECVD Nitride

Film thickness: 100Å – 5000Å on one side
Film stress: +400±50 MPa Tensile Stress

Low stress PECVD nitride

Film thickness: 100Å – 20,000Å on one side
Film stress: <250±50 MPa Tensile Stress

PECVD OxyNitride

Film thickness: 100Å – 20,000Å on one side
Film stress: -400±50 MPa Tensile Stress

Our Quality

Our LPCVD and PECVD nitride is stable and highly consistent. It can give you excellent coverage of edges, high thermal stability, and very good uniformity.

Contact one of our sales representative today! Contact one of our sales representative today!

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