Types of LPCVD NITRIDE
LPCVD Nitride – Low Pressure Chemical Vapor Deposition Nitride
Applied to both sides of the wafer at the same time.
Used where temperature is not critical.
The higher temperature process which leads to more stable, higher purity film.
Stoichiometric LPCVD Nitride
Film thickness: 100Å – 4500Å on both sides
Film stress: =>800±50 MPa Tensile Stress
Low Stress LPCVD Nitride
Film thickness: 100Å – 20,000Å on both sides
Film stress: <250±50 mpa tensile stress
Super Low Stress LPCVD Nitride
Film thickness: 100Å – 20,000Å on both sides
Film stress: <100±50 mpa tensile stress
